Prof. Frank Wyrowski from Friedrich-Schiller-University of Jena, Germany, was awarded the “Visiting Professor for Senior International Scientists of CAS” in August, 2013. He has been involved in a two-month cooperation research with Shanghai Institute of Optics and Fine Mechanics (SIOM), CAS. The peer review was organized by Laboratory of Information Optics and Optoelectronic Technology (IOOE), SIOM, CAS on February 27, 2014. The peer experts reviewed Prof. Frank Wyrowski’s academic report of the international cooperation project and got the following conclusions:

During his two-month research at SIOM last year, significant progress had been made on the design and modeling of the key element of the lithographic illumination system. The simulation target and basic idea of the lithographic illumination system were established. A hybrid simulation algorithm which can transform simulation method between ray tracing and field tracing was proposed. The method to increase the efficiency of DOE had also been studied. As a result, the efficiency increased about 3% through decreasing SNR. In addition, four academic lectures entitled by "From ray to field tracing" were given to the relevant technical staffs from SIOM.

The peers reached the agreement that this project had completed the expected contents, promoted academic exchanges between two sides, and laid a solid foundation for future cooperation.